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1

In-situ detection method for wafer movement and micro-arc discharge around a wafer in plasma etching process using electrostatic chuck wafer stage with built-in acoustic emission sensor

Kasashima, Yuji, Tabaru, Tatsuo, Yasaka, Mitsuo, Kobayashi, Yoshikazu, Akiyama, Morito, Nabeoka, Natsuko, Motomura, Taisei, Sakamoto, Shingo, Uesugi, Fumihiko

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 621 KB

english, 2014

2

Observation of anisotropic microstructural changes during cycling in LiNi0.5Co0.2Mn0.3O2 cathode material

Kuriyama, Hiromichi, Saruwatari, Hidesato, Satake, Hideki, Shima, Amika, Uesugi, Fumihiko, Tanaka, Hiroki, Ushirogouchi, Tooru

Journal:

Journal of Power Sources

Year:

2015

Language:

english

File:

PDF, 2.53 MB

english, 2015

3

Resistless inverse projection patterning of aluminum by using synchrotron radiation induced suppression of thermal chemical vapor deposition

Fumihiko Uesugi, Iwao Nishiyama

Journal:

Applied Surface Science

Year:

1992

Language:

english

File:

PDF, 539 KB

english, 1992

4

Thin Type Acoustic Emission Sensor for Detection of Micro-arc Discharge

KASASHIMA, Yuji, TABARU, Tatsuo, KOBAYASHI, Yoshikazu, YASAKA, Mitsuo, SAKAMOTO, Shingo, AKIYAMA, Morito, UESUGI, Fumihiko

Journal:

Journal of the Vacuum Society of Japan

Year:

2014

File:

PDF, 1.01 MB

2014

5

Many flaked particles caused by impulsive force of electric field stress and effect of electrostriction stress in mass-production plasma etching equipment

Kasashima, Yuji, Nabeoka, Natsuko, Motomura, Taisei, Uesugi, Fumihiko

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 353 KB

english, 2014

6

Reduction of Particle Contamination in Plasma-Etching Equipment by Dehydration of Chamber Wall

Ito, Natsuko, Moriya, Tsuyoshi, Uesugi, Fumihiko, Matsumoto, Masao, Liu, Shenjian, Kitayama, Yoshihiko

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 203 KB

english, 2008

7

Chirality transitions and transport properties of individual few-walled carbon nanotubes as revealed by in situ TEM probing

Tang, Dai-Ming, Kvashnin, Dmitry G., Cretu, Ovidiu, Nemoto, Yoshihiro, Uesugi, Fumihiko, Takeguchi, Masaki, Zhou, Xin, Hsia, Feng-Chun, Liu, Chang, Sorokin, Pavel B., Kawamoto, Naoyuki, Mitome, Masano

Journal:

Ultramicroscopy

Year:

2018

Language:

english

File:

PDF, 1.15 MB

english, 2018

8

Reaction of Si2H2 molecule on a silicon surface

Yoshio Ohshita, Fumihiko Uesugi, Iwao Nishiyama

Journal:

Journal of Crystal Growth

Year:

1991

Language:

english

File:

PDF, 352 KB

english, 1991

9

Synchrotron-radiation-induced growth suppression and initiation in molecular-beam chemical vapor deposition of aluminum

Fumihiko Uesugi, Iwao Nishiyama

Journal:

Applied Surface Science

Year:

1992

Language:

english

File:

PDF, 995 KB

english, 1992

10

Development and evaluation of magnesium oxide-based ceramics for chamber parts in mass-production plasma etching equipment

Kasashima, Yuji, Tsutsumi, Kota, Mitomi, Shinzo, Uesugi, Fumihiko

Journal:

Japanese Journal of Applied Physics

Year:

2017

Language:

english

File:

PDF, 1.56 MB

english, 2017

11

Evaluation of two-dimensional strain distribution by STEM/NBD

Fumihiko Uesugi, Akira Hokazono, Shiro Takeno

Journal:

Ultramicroscopy

Year:

2011

Language:

english

File:

PDF, 430 KB

english, 2011

12

Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition

Fumihiko Uesugi, Iwao Nishiyama

Journal:

Applied Surface Science

Year:

1994

Language:

english

File:

PDF, 325 KB

english, 1994

13

Distortion Measurement of Multi-Finger Transistor Using Split Higher-Order Laue Zone Lines Analysis

Uesugi, Fumihiko, Yamazaki, Takashi, Kuramochi, Koji, Hashimoto, Iwao, Kojima, Kenji, Takeno, Shiro

Journal:

Japanese Journal of Applied Physics

Year:

2008

Language:

english

File:

PDF, 278 KB

english, 2008

14

Direct projection patterning of aluminum on the SiO2 surface by using synchrotron radiation induced growth initiation of thermal chemical vapor deposition

Fumihiko Uesugi, Iwao Nishiyama

Journal:

Applied Surface Science

Year:

1992

Language:

english

File:

PDF, 421 KB

english, 1992

15

[IEEE 2016 International Symposium on Semiconductor Manufacturing (ISSM) - Tokyo, Japan (2016.12.12-2016.12.13)] 2016 International Symposium on Semiconductor Manufacturing (ISSM) - Monitoring method for deposited film causing particles in mass-production plasma etching process using a load impedance monitoring system

Kasashima, Yuji, Uesugi, Fumihiko

Year:

2016

Language:

english

File:

PDF, 4.26 MB

english, 2016

16

Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition II. Surface analysis by Auger electron spectroscopy

Iwao Nishiyama, Fumihiko Uesugi

Journal:

Applied Surface Science

Year:

1996

Language:

english

File:

PDF, 744 KB

english, 1996

17

Lidocaine tape relieves pain due to needle insertion during stellate ganglion block

Takefumi Inada, Fumihiko Uesugi, Shoji Kawachi, Kohso Inada

Journal:

Canadian Journal of Anesthesia/Journal canadien d'anesthésie

Year:

1997

Language:

english

File:

PDF, 304 KB

english, 1997

18

The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition

Ito, Natsuko, Moriya, Tsuyoshi, Uesugi, Fumihiko, Moriya, Shuji, Aomori, Masaru, Kato, Yoshinori, Tachibana, Mitsuhiro

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2001

Language:

english

File:

PDF, 561 KB

english, 2001

19

Clinicopathological Study of 24 Cases of Pemphigoid; 類天疱瘡24例に関する臨床病理学的検討;

NAKAGAWA, Chisato, TSUSHIMA, Fumihiko, SAKURAI, Jinkyo, UESUGI, Atsushi, SATO, Kiyoshi, ODA, Seiichiro, HARADA, Hiroyuki

Journal:

Journal of Japanese Society of Oral Medicine

Year:

2019

File:

PDF, 930 KB

2019

20

Real-time monitoring of scattered laser light by a single particle of several tens of nanometers in the etching chamber in relation to its status with the equipment

Uesugi, Fumihiko

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

1998

Language:

english

File:

PDF, 532 KB

english, 1998

21

Photoelectron Holographic Atomic Arrangement Imaging of Cleaved Bimetal-intercalated Graphite Superconductor Surface

Matsui, Fumihiko, Eguchi, Ritsuko, Nishiyama, Saki, Izumi, Masanari, Uesugi, Eri, Goto, Hidenori, Matsushita, Tomohiro, Sugita, Kenji, Daimon, Hiroshi, Hamamoto, Yuji, Hamada, Ikutaro, Morikawa, Yoshi

Journal:

Scientific Reports

Year:

2016

Language:

english

File:

PDF, 2.04 MB

english, 2016

22

Monitoring of Condition of Deposited Film Causing Particles in Plasma Etching by Using Practical Load Impedance Monitoring Method

KASASHIMA, Yuji, UESUGI, Fumihiko

Journal:

Journal of the Vacuum Society of Japan

Year:

2016

Language:

english

File:

PDF, 2.23 MB

english, 2016

23

A Case of Secondary Syphilis with Inflammation of Oral Mucosa; 口内炎を契機に診断された第二期梅毒の1例;

UESUGI, Atsushi, TSUSHIMA, Fumihiko, SHIMIZU, Risa, NAKAGAWA, Chisato, SATO, Kiyoshi, SAKURAI, Jinkyo, HARADA, Hiroyuki

Journal:

Journal of Japanese Society of Oral Medicine

Year:

2019

File:

PDF, 717 KB

2019

24

Unusual circulatory responses in a case of acute idiopathic pandysautonomia

Masashi Kawamoto, Kengo Nishioka, Fumihiko Uesugi, Aya Kobayashi, Osafumi Yuge

Journal:

Journal of Anesthesia

Year:

1995

Language:

english

File:

PDF, 267 KB

english, 1995

25

Effect of External Magnetic Field on Compact Inductively-coupled Reactive Ion Etching Reactor

MOTOMURA, Taisei, TAKAHASHI, Kazunori, KASASHIMA, Yuji, UESUGI, Fumihiko, ANDO, Akira

Journal:

Journal of the Vacuum Society of Japan

Year:

2015

Language:

english

File:

PDF, 961 KB

english, 2015

26

Chalcogenide Materials Engineering for PhaseâChange Memory and Future Electronics Applications: From SbâTe to BiâTe

Saito, Yuta, Mitrofanov, Kirill V., Makino, Kotaro, Fons, Paul, Kolobov, Alexander V., Tominaga, Junji, Uesugi, Fumihiko, Takeguchi, Masaki

Journal:

physica status solidi (RRL) - Rapid Research Letters

Year:

2020

File:

PDF, 651 KB

2020

27

Continuous cardiac output measurement by thermodeprivation is unsatisfactory in cardiac surgical patients

Fumihiko Uesugi, Takefumi Inada, Kohso Inada, Shoji Kawachi, Mitsuhiko Matsuda

Journal:

Journal of Cardiothoracic and Vascular Anesthesia

Year:

1996

Language:

english

File:

PDF, 274 KB

english, 1996

28

OI0343 Oral lichen planus: a retrospective study of 416 Japanese patients

Matsumoto, Kanako, Tsushima, Fumihiko, Sakurai, Jinkyo, Sato, Masaru, Uesugi, Atsushi, Oda, Seiichirou, Omura, Ken

Journal:

Oral Surgery Oral Medicine Oral Pathology and Oral Radiology

Year:

2014

Language:

english

File:

PDF, 66 KB

english, 2014

29

Numerous flaked particles instantaneously generated by micro-arc discharge in mass-production plasma etching equipment

Kasashima, Yuji, Motomura, Taisei, Nabeoka, Natsuko, Uesugi, Fumihiko

Journal:

Japanese Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 2.12 MB

english, 2015

30

Monitoring of inner wall condition in mass-production plasma etching process using a load impedance monitoring system

Kasashima, Yuji, Kurita, Hiroyuki, Kimura, Naoya, Ando, Akira, Uesugi, Fumihiko

Journal:

Japanese Journal of Applied Physics

Year:

2015

Language:

english

File:

PDF, 249 KB

english, 2015

31

Generation of positively charged particles at an anode and transport to device wafers in a real radio frequency plasma etching chamber for tungsten etch-back process

Moriya, Tsuyoshi, Ito, Natsuko, Uesugi, Fumihiko, Hayashi, Yuji, Okamura, Koji

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2000

Language:

english

File:

PDF, 495 KB

english, 2000

32

Real-time characteristic impedance monitoring for end-point and anomaly detection in the plasma etching process

Motomura, Taisei, Kasashima, Yuji, Uesugi, Fumihiko, Kurita, Hiroyuki, Kimura, Naoya

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 594 KB

english, 2014

33

Feasibility study of detection of dielectric breakdown of gate oxide film by using acoustic emission method

Kasashima, Yuji, Tabaru, Tatsuo, Uesugi, Fumihiko

Journal:

Japanese Journal of Applied Physics

Year:

2016

Language:

english

File:

PDF, 1.07 MB

english, 2016

34

Electrical conduction and field emission of single-crystalline GdB44Si2 nanowire

Tang, Shuai, Tang, Jie, Chiu, Ta-Wei, Yuan, Jinshi, Tang, Dai-Ming, Mitome, Masanori, Uesugi, Fumihiko, Nemoto, Yoshihiro, Takeguchi, Masaki, Qin, Lu-Chang

Journal:

Year:

2020

File:

PDF, 1.71 MB

2020

35

Temperature dependence of synchrotron radiation induced growth initiation in the molecular beam chemical vapor deposition of Al on a SiO2 surface

Fumihiko Uesugi, Iwao Nishiyama

Journal:

Applied Surface Science

Year:

1993

Language:

english

File:

PDF, 365 KB

english, 1993

36

Discussion on “An analysis of the costs of electricity supply and distribution in Great Britain, with some suggestions as to the causes of and remedies for the slow rate of development” before the Institution, 2nd February, 1933

Motomura, Taisei, Kasashima, Yuji, Uesugi, Fumihiko, Kurita, Hiroyuki, Kimura, Naoya

Journal:

Journal of the Institution of Electrical Engineers

Year:

1933

Language:

english

File:

PDF, 898 KB

english, 1933

37

Transport of a helicon plasma by a convergent magnetic field for high speed and compact plasma etching

Takahashi, Kazunori, Motomura, Taisei, Ando, Akira, Kasashima, Yuji, Kikunaga, Kazuya, Uesugi, Fumihiko, Hara, Shiro

Journal:

Journal of Physics D Applied Physics

Year:

2014

Language:

english

File:

PDF, 70 KB

english, 2014

38

Evaluation of SF6 Reactive Ion Etching Performance with a Permanent Magnet Located behind the Substrate based on a Simple Design Concept

MOTOMURA, Taisei, TAKAHASHI, Kazunori, KASASHIMA, Yuji, Kikunaga, Kazuya, UESUGI, Fumihiko, ANDO, Akira

Journal:

Journal of the Vacuum Society of Japan

Year:

2016

Language:

english

File:

PDF, 974 KB

english, 2016

39

Real-space analysis of diffusion behavior and activation energy of individual monatomic ions in a liquid

Miyata, Tomohiro, Uesugi, Fumihiko, Mizoguchi, Teruyasu

Journal:

Science Advances

Year:

2017

Language:

english

File:

PDF, 664 KB

english, 2017

40

Metamorphic GaAs/GaAsBi Heterostructured Nanowires

Ishikawa, Fumitaro, Akamatsu, Yoshihiko, Watanabe, Kentaro, Uesugi, Fumihiko, Asahina, Shunsuke, Jahn, Uwe, Shimomura, Satoshi

Journal:

Year:

2015

Language:

english

File:

PDF, 7.78 MB

english, 2015

41

Instantaneous Generation of Many Flaked Particles by Impulsive Force of Electric Field Stress Acting on Inner Wall of Mass-Production Plasma Etching Equipment

Kasashima, Yuji, Nabeoka, Natsuko, Uesugi, Fumihiko

Journal:

Japanese Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 1.50 MB

english, 2013

42

Detection of microarc discharge using a high-speed load impedance monitoring system

Kasashima, Yuji, Motomura, Taisei, Kurita, Hiroyuki, Kimura, Naoya, Uesugi, Fumihiko

Journal:

Applied Physics Express

Year:

2014

Language:

english

File:

PDF, 1.66 MB

english, 2014

43

Anisotropic Si Etching by a Supersonic Cl2 Beam

Teraoka, Yuden, Uesugi, Fumihiko, Nishiyama, Iwao

Journal:

MRS Proceedings

Year:

1991

Language:

english

File:

PDF, 2.03 MB

english, 1991

44

A controllable and efficient method for making single HfC nanowire field-emission point electron source aided by low keV FIB milling

Tang, Shuai, Tang, Jie, Chiu, Ta-Wei, Uzuhashi, Jun, Tang, Dai-Ming, Ohkubo, Tadakatsu, Mitome, Masanori, Uesugi, Fumihiko, Takeguchi, Masaki, Qin, Lu-Chang

Journal:

Year:

2020

File:

PDF, 1.41 MB

2020

45

OI0380 The long-term outcomes of oral lichen planus, patterns of remission, and relapse

Oda, Seiichiro, Sakurai, Jinkyo, Tsushima, Fumihiko, Sato, Masaru, Uesugi, Atsushi, Matsumoto, Kanako, Omura, Ken

Journal:

Oral Surgery Oral Medicine Oral Pathology and Oral Radiology

Year:

2014

Language:

english

File:

PDF, 65 KB

english, 2014

46

Structural variation of Li2MnO3 during charge–discharge cycling

NAKAO, Yasuhiro, OZAWA, Kiyoshi, NEMOTO, Yoshihiro, UESUGI, Fumihiko, FUJII, Hiroki, MOCHIKU, Takashi

Journal:

Journal of the Ceramic Society of Japan

Year:

2015

Language:

english

File:

PDF, 5.27 MB

english, 2015

47

Increase in Size of Flaked Particles Suddenly Generated by Impulsive Force in Mass-production Plasma Etching Equipment

KASASHIMA, Yuji, UESUGI, Fumihiko

Journal:

Journal of the Vacuum Society of Japan

Year:

2016

Language:

english

File:

PDF, 842 KB

english, 2016

48

A HfC nanowire point electron source with oxycarbide surface of lower work function for high-brightness and stable field-emission

Tang, Shuai, Tang, Jie, Chiu, Ta-wei, Hayami, Wataru, Uzuhashi, Jun, Ohkubo, Tadakatsu, Uesugi, Fumihiko, Takeguchi, Masaki, Mitome, Masanori, Qin, Lu-Chang

Journal:

Year:

2020

File:

PDF, 2.50 MB

2020

49

New molecular compound precursor for aluminum chemical vapor deposition

Tsutomu Shinzawa, Fumihiko Uesugi, Iwao Nishiyama, Kazumi Sugai, Shunji Kishida, Hidekazu Okabayashi

Journal:

Applied Organometallic Chemistry

Year:

2000

Language:

english

File:

PDF, 192 KB

english, 2000

50

Impulsive force phenomenon of electric field stress causing serious particle contamination in plasma etching equipment

Kasashima, Yuji, Uesugi, Fumihiko

Journal:

Japanese Journal of Applied Physics

Year:

2014

Language:

english

File:

PDF, 971 KB

english, 2014

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